MicroLEDs offer the potential to develop a variety of displays in a number of new formats and with exceptional performance with luminance, efficiency, and color gamut unavailable with other techniques. One of the challenges in microLED displays, however, has been the dramatic change in device efficiency over the bias applied in operating devices, especially as pixel size is reduced. In this work, we show a path towards optimizing the efficiency of small format microLEDs through optimization of the electrode area and reduction in damage to individual chiplets by reducing the area exposed to etching in microLED devices.