[FMCp1-3] Improvement of Lithography Process Capability under Limit Pitch Design in TFT-LCD Devices
PR appearance, Lithography process, Full-screen-display
Full-screen-display with line pitch 4µm was developed and fabricated successfully under Nikon 68s lithography system with normal mask. Key parameters including PR THK and taper through lithography process were studied. Finally, we have realized the mass production of pitch 4um lithography process and the capacity is increased by 30%.