International Display Workshops General Incorporated Association

[FMCp1-3] Improvement of Lithography Process Capability under Limit Pitch Design in TFT-LCD Devices

*Lihua Zheng1, Xuexin Lan1, Jiancan Lin1, Chao Deng1, Jie Lin1, Guozhao Chen1, Junyi Li1 (1.Xiamen Tianma Microelectronics Co., Ltd. (China))

PR appearance, Lithography process, Full-screen-display

https://doi.org/10.36463/idw.2021.0284

Full-screen-display with line pitch 4µm was developed and fabricated successfully under Nikon 68s lithography system with normal mask. Key parameters including PR THK and taper through lithography process were studied. Finally, we have realized the mass production of pitch 4um lithography process and the capacity is increased by 30%.