Improvement of Lithography Process Capability under Limit Pitch Design in TFT-LCD Devices

[FMCp1-3] Improvement of Lithography Process Capability under Limit Pitch Design in TFT-LCD Devices

*Lihua Zheng¹, Xuexin Lan¹, Jiancan Lin¹, Chao Deng¹, Jie Lin¹, Guozhao Chen¹, Junyi Li¹ (1.Xiamen Tianma Microelectronics Co., Ltd. (China))

PR appearance, Lithography process, Full-screen-display

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