International Display Workshops General Incorporated Association

[FMCp1-9L] Near Infrared Photolithography and its Photoresist

*Akihiko Igawa1、Ming-Ann Hsu2 (1.eChem Solutions Japan Inc. (Japan)、2.Consistent Electronic Materials Inc. (Taiwan))

Near IR, Infrared, Photolithography, Photoresist, Black Photoresist

https://doi.org/10.36463/idw.2021.0302

Novel photolithography using NIR (Near Infrared) exposure and its photoresist are developed. Using NIR’s extreme high transparency to photoresist polymer layer, photoresist with very high photosensitivity and vertical profile can be achieved. Adding organic black pigment that blocks UV/Visible light but is transparent to NIR, a black photoresist with vertical profile and high film thickness can be made.