[AMDp1-4] Improvement of Electrical Performance of Te/TeO Thin Film Transistors Using Sputtering at Room Temperature

*Seung Min Lee¹、Seong Cheol Jang¹、Hyun-Suk Kim¹ (1.Chungnam National University (Korea))

CMOS, Tellurium, Tellurium Oxide, thin film transistor, Bilayer

https://doi.org/10.36463/idw.2022.0210