Application of Dark-Field Microscopy to the Coloration Mechanism Analysis of Ag Deposition-Based Electrochromic Device

Shun Uji

doi:https://doi.org/10.36463/idw.2022.0820

10:40 〜 11:00

[EP2-2] Application of Dark-Field Microscopy to the Coloration Mechanism Analysis of Ag Deposition-Based Electrochromic Device

*Shun Uji¹、Kazuki Nakamura¹、Norihisa Kobayashi¹ (1.Chiba University (Japan))

Electrochromism, Silver, Electrodeposition, Localized surface plasmon resonance, Dark-field microscopy

https://doi.org/10.36463/idw.2022.0820

We have studied Ag deposition-based electrochromic (EC) device that can represent various optical states. In this study, dark-field microscopy (DFM) was applied to in situ observation of localized surface plasmon resonance (LSPR) of Ag electrodeposits. Light scattering spectra obtained DFM provided detailed information on the LSPR.

Proceedings of the International Display Workshops Volume 29 (IDW '22)

[EP2-2] Application of Dark-Field Microscopy to the Coloration Mechanism Analysis of Ag Deposition-Based Electrochromic Device