Control of Mesa Shape by ICP-RIE Condition to Fabricate Monolithically Integrated Micro-LEDs

Yamato Yamazaki, Takeyoshi Onuma, Tomohiro Yamaguchi, Tohru Honda

doi:https://doi.org/10.36463/idw.2022.0316

[FMCp1-3] Control of Mesa Shape by ICP-RIE Condition to Fabricate Monolithically Integrated Micro-LEDs

*Yamato Yamazaki¹, Takeyoshi Onuma¹, Tomohiro Yamaguchi¹, Tohru Honda¹ (1.Kogakuin University (Japan))

micro-LED, pixel, monolithic

https://doi.org/10.36463/idw.2022.0316

We assessed dry etching conditions to form a gentle slope for the side surface of GaN mesa structure. The technique enables us to prevent the electrode disconnection when the top-down monolithic integration method is employed to fabricate the micro-LED displays.

Proceedings of the International Display Workshops Volume 29 (IDW '22)

[FMCp1-3] Control of Mesa Shape by ICP-RIE Condition to Fabricate Monolithically Integrated Micro-LEDs