International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 29 (IDW '22)

Proceedings of the International Display Workshops Volume 29 (IDW '22)

2022年12月14日 〜 2022年12月16日
Fukuoka International Congress Center

[FMCp1-5] COG 2.45mm-down-border based on 10mask

*YUAN YUAN ZHONG1、XUEXIN LAN1、CHUNRONG LIN1、JIE LIN1、SHANGFU CAI1、YUTIAN LIU1、BAILING TANG1、WANYU SU1、CHANGJUAN ZHANG1、GUOZHAO CHEN1、XIANYAN YANG1 (1.Xiamen Tianma Microelectronics Co. (China))

Narrow border, COG 2.45 mm-down-border, LCM, Full-screen-display

https://doi.org/10.36463/idw.2022.0323

The research of narrow border products is the direction of the display industry. With the introduction of reduced mask products, it poses a major challenge to the compression of the down border. Based on the panel design and structure of 10mask narrow border products, the technology of PSM mask is used to compress the M1/M2 Fan-out pitch to 3.5 μm and the distance between IC...