16:00 〜 16:20
[AMD4-3] Metal Oxynitride Semiconductor for Ferroelectric HfZrOx Thin Film Devices
metal oxynitride, metal oxide, ferroelectric, HfZrOx
We observed the mechanical confinement effect of low bandgap metal oxynitride semiconductor, known as oxygen vacancy (VO) free. Typical polarization-voltage (P-V) hysteresis curve was obtained by metal-ferroelectric-semiconductor-metal structure, and the endurance property was improved over metal oxide semiconductor.