International Display Workshops General Incorporated Association

4:00 PM - 4:20 PM

[AMD4-3] Metal Oxynitride Semiconductor for Ferroelectric HfZrOx Thin Film Devices

*Yuseong Jang1, Seung Yoon Shin1, Soo-Yeon Lee1 (1. Seoul National University (Korea))

metal oxynitride, metal oxide, ferroelectric, HfZrOx

https://doi.org/10.36463/idw.2023.0194

We observed the mechanical confinement effect of low bandgap metal oxynitride semiconductor, known as oxygen vacancy (VO) free. Typical polarization-voltage (P-V) hysteresis curve was obtained by metal-ferroelectric-semiconductor-metal structure, and the endurance property was improved over metal oxide semiconductor.