International Display Workshops General Incorporated Association

[AMDp2-5] Influence of Gate Work Function on Electrical Characteristics of a-IGZO TFT with Field Plate Structure

*Shou-An Hu1, Po-Hao Huang1, Chih-Chieh Hsu1 (1. National Yunlin University of Science and Techology (Taiwan))

Amorphous, Transistor, InGaZnO, Field plate, Work Function

https://doi.org/10.36463/idw.2023.0289

Effect of gate work function on threshold voltage, mobility, and sub-threshold swing of channel-passivated amorphous InGaZnO thin-film transistor with field plate structure is investigated. By analyzing the device performance and carrier concentration distribution, the related physical mechanisms are explored. An optimal TFT design is proposed.