Direct Patterning of Colloidal Indium Phosphide Quantum Dots via Photo Active Material Benzophenone

Boram Kim

doi:https://doi.org/10.36463/idw.2023.0404

3:40 PM - 4:00 PM

[FMC11-2L] Direct Patterning of Colloidal Indium Phosphide Quantum Dots via Photo Active Material Benzophenone

*Boram Kim¹, Mina Kim¹, Heeyeop Chae^1,2 (1. Sungkyunkwan University (Korea), 2. Sungkyunkwan advanced institute of nanotechnology (Korea))

Quantum dots, Patterning, Photo active material, benzophenone

https://doi.org/10.36463/idw.2023.0404

A solution-based process utilizing dibenzophenone (DIBP) has been developed to create quantum dot (QD) patterns. UV exposure of DIBP generates ketyl radicals that interact with QDs. These cross-linked QDs remain solvent-resistant while preserving their optical properties. Photo patterning leverages UV-induced solubility differences, successfully achieving a 50 μm line pattern

Proceedings of the International Display Workshops Volume 30 (IDW '23)

[FMC11-2L] Direct Patterning of Colloidal Indium Phosphide Quantum Dots via Photo Active Material Benzophenone