International Display Workshops General Incorporated Association

15:30 〜 15:50

[FMC2-3] Thin Film Photopatternable Quantum Dot Downconverters with High Optical Density

*Yu Kambe1, Alexis Miranda1, Nisa Zaheer1, Rivi J. Ratnaweera1, Forrest Etheridge1, Colin Suits2,1, Marissa Tranquilli1, Richard Schaller4,5, Dmitri Talapin3,1, Yu Kambe1 (1. NanoPattern Technologies (United States of America), 2. University of California, Berkeley (United States of America), 3. University of Chicago (United States of America), 4. Northwestern University (United States of America), 5. Argonne National Laboratory (United States of America))

Quantum Dot, Photolithography, MicroLED

https://doi.org/10.36463/idw.2023.0333

We demonstrate a scalable fabrication method for microLED displays using photopatternable InP-based QDs. Using photosensitive ligands, we demonstrate pixel resolutions of 10 μm with EQE of >40% in <10 μm thickness. Accelerated reliability is measured and modeled to calculate an expected lifetime of >10k hours for direct-view microLED operating conditions.