[MEETp1-4] Enhancing the Stability and Performance of Coplanar InGaSnO Thin-Film Transistors by N2O Annealing
InGaSnO(IGTO), Thin-film transistor(TFT), N2O annealing, self-aligned coplanar
We report a method to improve the performance of coplanar amorphous InGaSnO thin-film transistors by N2O post annealing at 380 oC. This annealing leads to improved electrical properties and stability. N2O post annealing leads to hysteresis free transfer curve and stable TFT characteristics with enhanced field-effect mobility from 8.13 to 37.60 cm2/Vs.