International Display Workshops General Incorporated Association

3:40 PM - 4:00 PM

[OLED3-2 (Invited)] OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography

*Yasumasa Yamane1, Nozomu Sugisawa1, Daiki Nakamura1, Toshiyuki Isa1, Hitomi Sato1, Daigo Shimada1, Shingo Eguchi1, Toshiki Mizuguchi1, Yuki Tamatsukuri1, Minato Ito1, Kentaro Sugaya1, Takahiro Fujie1, Yuichi Yanagisawa1, Yoshikazu Hiura1, Ryota Hodo1, Shinya Sasagawa1, Hitoshi Kunitake1, Shunpei Yamazaki1 (1. Semiconductor Energy Laboratory Co., Ltd. (Japan))

OLED, metal mask-less lithography (MML), SBS

https://doi.org/10.36463/idw.2023.0569

We developed a side-by-side photolithographic patterning technology not using a fine metal mask to achieve high resolution for all RGB pixels. This technology will be a general-purpose technology for fabricating OLEDs because of its scalability and wide application to AR/VR microdisplays, small- or medium-sized smartphone displays, and large-sized TVs.