OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography

Yasumasa Yamane

doi:https://doi.org/10.36463/idw.2023.0569

3:40 PM - 4:00 PM

[OLED3-2 (Invited)] OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography

*Yasumasa Yamane¹, Nozomu Sugisawa¹, Daiki Nakamura¹, Toshiyuki Isa¹, Hitomi Sato¹, Daigo Shimada¹, Shingo Eguchi¹, Toshiki Mizuguchi¹, Yuki Tamatsukuri¹, Minato Ito¹, Kentaro Sugaya¹, Takahiro Fujie¹, Yuichi Yanagisawa¹, Yoshikazu Hiura¹, Ryota Hodo¹, Shinya Sasagawa¹, Hitoshi Kunitake¹, Shunpei Yamazaki¹ (1. Semiconductor Energy Laboratory Co., Ltd. (Japan))

OLED, metal mask-less lithography (MML), SBS

https://doi.org/10.36463/idw.2023.0569

We developed a side-by-side photolithographic patterning technology not using a fine metal mask to achieve high resolution for all RGB pixels. This technology will be a general-purpose technology for fabricating OLEDs because of its scalability and wide application to AR/VR microdisplays, small- or medium-sized smartphone displays, and large-sized TVs.

Proceedings of the International Display Workshops Volume 30 (IDW '23)

[OLED3-2 (Invited)] OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography