[S-4] Ion Implantation & Device Technology (II) S. Namba、T. Tokuyama、M. Tsurushima、H. Ohmura (1.Osaka University、2.Hitachi Ltd.、3.Electrotechnical Laboratory、4.Tokyo Shibaura Electric Co., Ltd.) https://doi.org/10.7567/SSDM.1972.S-4