[2-4] Anomalous Enhancement of Etching Rate of Silicon Nitride with HF Etchant by Ion Implantation

Y. Akasaka、K. Horie K. Nomura、S. Kawazu (1.Central Research Laboratory, Mitsubishi Electric Corp.、2.Kitaitami Works)

https://doi.org/10.7567/SSDM.1973.2-4