[2-4] Anomalous Enhancement of Etching Rate of Silicon Nitride with HF Etchant by Ion Implantation

Y. Akasaka, K. Horie K. Nomura, S. Kawazu (1.Central Research Laboratory, Mitsubishi Electric Corp., 2.Kitaitami Works)

https://doi.org/10.7567/SSDM.1973.2-4