[A-1-3] Microfabrication of Anti-Reflective Chromium Mask by Gas Plasmas

Haruhiko ABE, Kyusaku NISHIOKA, Setsuko TAMURA, Akira NISHIMOTO (1.Central Research Laboratories, Mitsubishi Electric Corp., 2.Kitaitami Works, Mitsubishi Electric Corp.)

https://doi.org/10.7567/SSDM.1975.A-1-3