[A-1-3] Microfabrication of Anti-Reflective Chromium Mask by Gas Plasmas
Haruhiko ABE, Kyusaku NISHIOKA, Setsuko TAMURA, Akira NISHIMOTO
(1.Central Research Laboratories, Mitsubishi Electric Corp., 2.Kitaitami Works, Mitsubishi Electric Corp.)
https://doi.org/10.7567/SSDM.1975.A-1-3