[A-1-3] Microfabrication of Anti-Reflective Chromium Mask by Gas Plasmas
Haruhiko ABE、Kyusaku NISHIOKA、Setsuko TAMURA、Akira NISHIMOTO
(1.Central Research Laboratories, Mitsubishi Electric Corp.、2.Kitaitami Works, Mitsubishi Electric Corp.)
https://doi.org/10.7567/SSDM.1975.A-1-3