SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) FILMS APPLIED TO MOS INTEGRATED CIRCUITS

H. Yamoto; M. Okayama; T. Aoki; H. Mochizuki; M. Abe; T. Ando

doi:https://doi.org/10.7567/SSDM.1975.A-2-2

1975 Conference on Solid State Devices

Sep 1, 1975 - Sep 2, 1975
The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-2-2] SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) FILMS APPLIED TO MOS INTEGRATED CIRCUITS

H. Yamoto, M. Okayama, T. Aoki, H. Mochizuki, M. Abe, T. Ando (1.SONY Corp. Semiconductor Product Div. and Semiconductor Development Div. Atsugi Plant)

https://doi.org/10.7567/SSDM.1975.A-2-2

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