[A-2-2] SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) FILMS APPLIED TO MOS INTEGRATED CIRCUITS

H. Yamoto、M. Okayama、T. Aoki、H. Mochizuki、M. Abe、T. Ando (1.SONY Corp. Semiconductor Product Div. and Semiconductor Development Div. Atsugi Plant)

https://doi.org/10.7567/SSDM.1975.A-2-2