[A-2-3] Application of Diffusion from Implanted Polysilicon to Bipolar Transistors

Y. AKASAKA, K. TSUKAMOTO, M. KAWAGUCHI, H. SATO, K. HORIE, H. KOMIYA (1.Central Research Laboratory, Kitaitami Works, Mitsubishi Electric Corp.)

https://doi.org/10.7567/SSDM.1975.A-2-3