[A-2-3] Application of Diffusion from Implanted Polysilicon to Bipolar Transistors
Y. AKASAKA、K. TSUKAMOTO、M. KAWAGUCHI、H. SATO、K. HORIE、H. KOMIYA
(1.Central Research Laboratory, Kitaitami Works, Mitsubishi Electric Corp.)
https://doi.org/10.7567/SSDM.1975.A-2-3