[A-1-4] Anomalous Residual Defects in Silicon after Annealing of Through-Oxide Phosphorus Implanted Samples

N. Natsuaki、M. Tamura、M. Miyao、T. Tokuyama (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1976.A-1-4