[A-4-3] Interfacial Doping by Recoil Implantation for Nonvolatile Memories

T. Ito, S. Hijiya, H. Nishi, M. Shinoda, T. Furuya (1.FUJITSU LABORATORIES LTD.)

https://doi.org/10.7567/SSDM.1977.A-4-3