[A-4-3] Interfacial Doping by Recoil Implantation for Nonvolatile Memories

T. Ito、S. Hijiya、H. Nishi、M. Shinoda、T. Furuya (1.FUJITSU LABORATORIES LTD.)

https://doi.org/10.7567/SSDM.1977.A-4-3