[A-6-4] MOS LSI Fabrication Process Using Direct Electron Beam Writing Y. Sakakibara, E. Arai, H. Yoshino, T. Kobayashi, H. Akiya, K. Hirata (1.Musashino Electrical Communication Laboratory, NTT) https://doi.org/10.7567/SSDM.1978.A-6-4