[C-2-3] High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique

Tomonobu Hata, Toshiharu Minamikawa, Etsuji Noda, Toshio Hada (1.Faculty of Technology, Kanazawa University)

https://doi.org/10.7567/SSDM.1978.C-2-3