[C-2-3] High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique Tomonobu Hata、Toshiharu Minamikawa、Etsuji Noda、Toshio Hada (1.Faculty of Technology, Kanazawa University) https://doi.org/10.7567/SSDM.1978.C-2-3
