[A-1-5] Electron Beam Mask Fabrication for MOSLSI's with 1 μm - 1.5 μm Design Rules

Shinji Okazaki、Kozo Mochiji、Eiji Takeda、Yoji Maruyama、Shojiro Asai (1.Central Research Laboratory、2.Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1979.A-1-5