[A-2-7] P-CHANNEL VERSUS N-CHANNEL IN MOS-ICs OF SUBMICRON CHANNEL LENGTHS Luong Mo DANG, Hiroshi IWAI, Yoshio NISHI, Shinji TAGUCHI (1.Toshiba R & D Center, 2.Toshiba Corporation c/o Horikawacho Works) https://doi.org/10.7567/SSDM.1979.A-2-7
