[A-2-7] P-CHANNEL VERSUS N-CHANNEL IN MOS-ICs OF SUBMICRON CHANNEL LENGTHS Luong Mo DANG、Hiroshi IWAI、Yoshio NISHI、Shinji TAGUCHI (1.Toshiba R & D Center、2.Toshiba Corporation c/o Horikawacho Works) https://doi.org/10.7567/SSDM.1979.A-2-7
