[B-6-1] Preparation and Characterization of Reactively-Sputtered Amorphous Si:H Films

S. Iizima, H. Okushi, A. Matsuda, K. Nakagawa, M. Matsumura, K. Tanaka (1.Electrotechnical Laboratory)

https://doi.org/10.7567/SSDM.1979.B-6-1