The Japan Society of Applied Physics

[A-2-4] Formation of a Double-Hetero Si/CoSi2/Si Structure Using Molecular Beam and Solid Phase Epitaxies

Shuichi Saitoh, Hiroshi Ishiwara, Seijiro Furukawa (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1980.A-2-4