[A-2-6] Negative Patterning of AZ1350J by Electron-beam Desensitization of Photo-sensitive Compound

Kozo Mochiji, Yoji Maruyama, Fumio Murai, Shinji Okazaki Yutaka Takeda, Shojiro Asai (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1980.A-2-6