[B-2-8] Optimization of GD a-Si:H Film Property for Photovoltaic Devices by Means of the Cross Field Plasma Deposition Technique

S. Hotta、N. Nishimoto、Y. Tawada、H. Okamoto、Y. Hamakawa (1.Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1981.B-2-8