[B-2-8] Optimization of GD a-Si:H Film Property for Photovoltaic Devices by Means of the Cross Field Plasma Deposition Technique

S. Hotta, N. Nishimoto, Y. Tawada, H. Okamoto, Y. Hamakawa (1.Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1981.B-2-8