[A-1-2] Study on Formation of Solid-Phase-Epitaxial CoSi2, Films and Patterning Effects

Kouichirou Ishibashi、Hiroshi Ishiwara、Seijiro Furukawa (1.Graduate School of Science and Engineering, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1983.A-1-2