[C-3-7LN] ArF Excimer Laser Induced Chemical Vapor Deposition of a-Si from Si2H6

A. Yoshikawa、S. Yamaga、K. Matsumoto、M. Takeuchi (1.Department of Electronic Engineering, Chiba University)

https://doi.org/10.7567/SSDM.1983.C-3-7LN