[A-2-2] Nanometer E-Beam Lithography Using 2-Layer Resist System Composed of Silicone-Based Negative Resist (SNR)

Akio Sugita、Masao Morita、Toshiaki Tamamura (1.Ibaraki Electrical Communication Laboratory, NTT)

https://doi.org/10.7567/SSDM.1984.A-2-2