Fine Pattern Difinition with Focused Ion Beams and Its Application to X-Ray Mask Fabrication

Toshihiko KANAYAMA; Masanori KOMURO; Hiroshi HIROSHIMA; Tsunehiro OHIRA; Nobufumi ATODA; Hisao TANOUE; Toshio TSURUSHIMA

doi:https://doi.org/10.7567/SSDM.1984.A-2-4

1984 International Conference on Solid State Devices and Materials

Aug 30, 1984 - Sep 1, 1984
International Conference Center Kobe, Kobe, Japan

[A-2-4] Fine Pattern Difinition with Focused Ion Beams and Its Application to X-Ray Mask Fabrication

Toshihiko KANAYAMA, Masanori KOMURO, Hiroshi HIROSHIMA, Tsunehiro OHIRA, Nobufumi ATODA, Hisao TANOUE, Toshio TSURUSHIMA (1.Electrotechnical Laboratory)

https://doi.org/10.7567/SSDM.1984.A-2-4

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