[A-2-4] Fine Pattern Difinition with Focused Ion Beams and Its Application to X-Ray Mask Fabrication

Toshihiko KANAYAMA、Masanori KOMURO、Hiroshi HIROSHIMA、Tsunehiro OHIRA、Nobufumi ATODA、Hisao TANOUE、Toshio TSURUSHIMA (1.Electrotechnical Laboratory)

https://doi.org/10.7567/SSDM.1984.A-2-4