[A-8] Lithography for Future Submicron Device Fabrication

Yasuo Tarui, Joseph Borel, B. F. Griffing, Koichiro Hoh, Tadao Kato, Toyoki Kitayama, M. P. Lepselter, Junji Matsui, Makoto Nakase, Jerome P. Silverman, Kenji Gamo (1.The Tokyo University of Agriculture, 2.Thomson-EFCIS, 3.Corporate R&D Center, General Electric, 4.Electrotechnical Lab., 5.LSI R&D Center, Mitsubishi Electric Co., 6.Atsugi ECL, NTT, 7.AT and T, Bell Lab., 8.Fundamental Res. Lab. Nippon Electric Co., 9.VLSI Res. Center, Toshiba Co., 10.IBM, Yorktown Heights, 11.Osaka University)

https://doi.org/10.7567/SSDM.1984.A-8