[B-2-5] Submicron Channel MOSFET Using Focused Boron Ion Beam Implantation into Silicon

Shoji SHUKURI、Yasuo WADA、Masao TAMURA、Hiroo MASUDA、Tohru ISHITANI (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1984.B-2-5