Chemical Analysis of Ultratrace Impurities in SiO2 Films

A. Shimazaki; H. Hiratsuka; Y. Matsushita; S. Yoshii

doi:https://doi.org/10.7567/SSDM.1984.B-4-3

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜 1984年9月1日
International Conference Center Kobe, Kobe, Japan

[B-4-3] Chemical Analysis of Ultratrace Impurities in SiO2 Films

A. Shimazaki、H. Hiratsuka、Y. Matsushita、S. Yoshii (1.Semiconductor Device Engineering Laboratory Toshiba Corporation、2.Integrated Circuit Division Toshiba Corporation)

https://doi.org/10.7567/SSDM.1984.B-4-3

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