Chemical Analysis of Ultratrace Impurities in SiO2 Films

A. Shimazaki; H. Hiratsuka; Y. Matsushita; S. Yoshii

doi:https://doi.org/10.7567/SSDM.1984.B-4-3

1984 International Conference on Solid State Devices and Materials

Aug 30, 1984 - Sep 1, 1984
International Conference Center Kobe, Kobe, Japan

[B-4-3] Chemical Analysis of Ultratrace Impurities in SiO2 Films

A. Shimazaki, H. Hiratsuka, Y. Matsushita, S. Yoshii (1.Semiconductor Device Engineering Laboratory Toshiba Corporation, 2.Integrated Circuit Division Toshiba Corporation)

https://doi.org/10.7567/SSDM.1984.B-4-3

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